Watch Jewelry Thin Film PVD Vacuum Deposition Machine

Watch Jewelry Thin Film PVD Vacuum Deposition Machine

Look at CZPT Slender CZPT PVD Vacuum Deposition CZPT

[PVD] 
Actual physical Vapor Deposition: Vacuum deposition approaches which can be utilised to deposit slim films and coatings.

Description 
Multi-arc Ion Sputtering Coating CZPT is higher executing and easy running, outfitted with arc sputtering method.
Substrate Material: Glass, Metallic, Ceramics Glass, Metal (carbon metal, stainless metal, brass), Ceramics, CZPT, jewellery.
Recommend CZPT: Multi Arc CZPTron Sputtering Plating CZPT
Framework Variety:  Vertical construction, #304 CZPT Steel
A. Coating CZPT: Multi-purposeful metallic movie, composite movie, transparent conductive film,  reflectance-growing movie, electromagnetic shielding film, decorative movie
B. CZPT Color: gold, rose gold, silver, colourful, sapphire blue, gun black, brown, darkish black, etc
C. CZPT kind: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in creation: CZPT, Chromium, Zirconium

Procedure

Application  
A. Observe industry, this sort of as observe belt, watchcase, dial etc.
B. CZPT, this sort of as sanitary ware, door manage, doorway locks
C. CZPT sector, such as stainless steel plate, stair handrail, columns
D. Phone shell, components
E. CZPT, eyeglasses frame
F. CZPT, this sort of as glass cup, glass lamps, glass artworks
G. Desk wares, like metal forks and knives.
H. Golfing wares, like golf head, golf pole and golfing balls.
 I. CZPT CZPT/bathroom wares
J. Large dimension sheet, plate, pipe, tube and so on. Like huge stainless metal plate and furnitures.

Advantages 
A. Pumps: 
CZPT pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump system)
B. Gas Technique: one-four route
C. Minimal Vacuum: 6*10-4 pa (cleanroom, no-loading)
D. Targets: arc 6-18sets, magnetron concentrate on 1-2sets
E. Electricity Resources: DC power source, Medium frequency power source, medium frequency electricity provide, heater source, activation energy supply, pulsed bias voltage electrical power provide
F. Targets: DC CZPTic Target, Medium Twin Target, Aircraft Goal
H. Gas Time : 5*10-4 pa, inside of 30mins
I. Controlled by Handbook, Semi-computerized, Total computerized, PLC

 
Workshop 

For a lot more particulars on configurations quotations, remember to speak to us.
HangZhou Danko Vacuum CZPT Co.,Ltd
EP
Sara

Watch Jewelry Thin Film PVD Vacuum Deposition Machine